Diffusion and Drift of Charge
Carriers in a Semiconductor
A p-n junction is a basis for
all transistor. It is formed in a single crystal silicon (Si) by doping the n-side with phosphorus (P)
atoms and the p-side with boron (B) atoms.
The doping can be achieved by
diffusing atoms from a liquid, solid or gaseous source of dopants atoms known
as a precursor. We can use ion implantation method, in which
dopant atoms are incorporated using high-energy ion beams or another method like thermally diffusing dopant atoms. Now,
each phosphorus atom contributes an extra electron and each boron atom
contributes to an extra hole. Consider
that the diffusion of the species is initiated by the concentration gradient and
temperature and then the external electric and magnetic field can initiate the
drift of carriers. Assume the temperature is 300K.
Firstly, we know that the concentration of electrons on the n-side (nn) is greater than that in the p-side (np) and vice versa. We also have a small concentration of
electrons (np) on the p-side, because bonds of silicon atoms break
due to thermal energy resulting in the creation of electron-hole pairs. Hence, due
to the concentration gradient, electrons in the n-side (nn) will
diffuse into the p-side and vice versa. Notice that across the p-n junction
there is a concentration gradient of P and B atoms as well. But, these atoms,
which now become ions after donating and accepting electrons, do not diffuse
since the temperature of 300K is too low.
As electrons diffuse from n-side
to p-side, a portion of the n-side crystal becomes positively charged since the
positively charged P ion is left behind. The same thing happens to the portion
of the p-side crystal. As more and more holes try to diffuse from p-side to n-side,
they encounter the positively charged P ion and their motion is resisted. Thus, always remember that the diffusion of electrons and
holes in a p-n junction does not continue until the concentration of electrons
and holes become equal, unlike the situation of two different glass
partitioned in a box. To prevent the equalization of electron and hole
concentrations, an internal electric field (Ex) sets up over a width
W and the resultant voltage is called contact potential (Vo).
Thus, this internal electric
field causes the electrons from p-side drift to n-side. Take note that here we are using the word drift, not diffuse, because the
movement of electrons and holes now is due to the electric field. Thus,
the flow of electrons due to diffusion and drift is in the opposite direction. The same goes for the holes. Hence, the electrical current due to diffusion and
drift of each type of carrier cancels out. As a result, a p-n junction under
equilibrium does not carry a net current.

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